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Method for measurement of transferred power to plasma in inductive dischargesHWANG, Hye-Ju; KIM, Young-Cheol; CHUNG, Chin-Wook et al.Thin solid films. 2013, Vol 547, pp 9-12, issn 0040-6090, 4 p.Conference Paper

Inductively coupled plasma etching to fabricate sensing window for polymer waveguide biosensor applicationXIBIN WANG; JIE MENG; XIAOQIANG SUN et al.Applied surface science. 2012, Vol 259, pp 105-109, issn 0169-4332, 5 p.Article

Spatial Distribution of C2 Spectra From Induction Thermal Plasmas With Polymer Powder InjectionTANAKA, Yasunori; SAKUYAMA, Toshiaki; TAKEUCHI, Yoshitaka et al.IEEE transactions on plasma science. 2008, Vol 36, Num 4, pp 1058-1059, issn 0093-3813, 2 p., 1Article

Deposition and characterization of low temperature silicon nitride films deposited by inductively coupled plasma CVDKSHIRSAGAR, Abhijeet; NYAUPANE, Pradeep; BODAS, Dhananjay et al.Applied surface science. 2011, Vol 257, Num 11, pp 5052-5058, issn 0169-4332, 7 p.Article

Comparisons of the electrical characteristics by impedance matching conditions on the E―H and H―E transition and the hysteresis of inductively coupled plasmaLEE, Hyo-Chang; CHUNG, Chin-Wook.Thin solid films. 2012, Vol 521, pp 185-188, issn 0040-6090, 4 p.Conference Paper

Narrow-band photoluminescence at room-temperature in amorphous SiCx:H filmZHOU, H. P; XU, M; WEI, D. Y et al.Journal of alloys and compounds. 2013, Vol 550, pp 279-282, issn 0925-8388, 4 p.Article

Hydrocarbon Plasma for Treatment of Biodegradable Food ContainersYUPING REN; XU, S; JIDONG LONG et al.IEEE transactions on plasma science. 2008, Vol 36, Num 4, pp 1306-1307, issn 0093-3813, 2 p., 1Article

External circuit system effects on chlorine plasma instabilitiesELLINGBOE, A. R; LAW, V. J; SOBERON, F et al.Electronics Letters. 2005, Vol 41, Num 9, pp 525-526, issn 0013-5194, 2 p.Article

Generation of Micro Inductively Coupled Plasma on a ChipTAGHIOSKOUI, Mazdak; ZAGHLOUL, Mona E; MONTASER, Akbar et al.IEEE transactions on plasma science. 2008, Vol 36, Num 4, pp 1262-1263, issn 0093-3813, 2 p., 1Article

Plasmas, ions et spectrométrie de masse = Plasmas,ions and spectrometryBEAUGRAND, C. G.Journal de chimie physique. 1993, Vol 90, Num 6, pp 1407-1410, issn 0021-7689Conference Paper

Inductively coupled plasma determination of nine rare-earth elements in sixty international geochemical reference samples = Détermination par plasma à couplage inductif de neuf terres rares dans soixante échantillons géochimiques de référenceROELANDTS, I.Geostandards newsletter. 1990, Vol 14, Num 1, pp 137-147, issn 0150-5505Article

Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design : Plasma ModellingKUSHNER, Mark J.Journal of physics. D, Applied physics (Print). 2009, Vol 42, Num 19, issn 0022-3727, 194013.1-194013.20Article

The application of inductively coupled plasma mass spectrometry in pharmaceutical and biomedical analysisJIANQUAN HUANG; XIN HU; JUNREN ZHANG et al.Journal of pharmaceutical and biomedical analysis. 2006, Vol 40, Num 2, pp 227-234, issn 0731-7085, 8 p.Article

Growth characteristics of micro-plasma oxidation ceramic coatings on Ti alloy by inductively coupled plasma-atomic emission spectrometer techniqueZHONGPING YAO; ZHAOHUA JIANG; FUPING WANG et al.Applied surface science. 2007, Vol 253, Num 9, pp 4267-4272, issn 0169-4332, 6 p.Article

Computer simulation of enclosed inductively coupled plasma discharges. I: Monatomic gasesGAILLAT, A; BARNES, R. M; PROULX, P et al.Journal of analytical atomic spectrometry (Print). 1995, Vol 10, Num 11, pp 935-940, issn 0267-9477Conference Paper

La détermination multiéléments des roches par spectrométrie d'émission à plasma couplé inductivementIMAI, N.1986, Vol 37, Num 10, pp 515-523, issn 0016-7665Article

Elemental Compositions of Over 80 Cell PhonesCHRISTIAN, Beverley; ROMANOV, Alexandre; ROMANOVA, Irina et al.Journal of electronic materials. 2014, Vol 43, Num 11, pp 4199-4213, issn 0361-5235, 15 p.Article

An auto-focus system fo reproducible focusing in laser ablation inductively coupled plasma mass spectrometryCOUSIN, H; WEBER, A; MAGYAR, B et al.Spectrochimica acta. Part B : Atomic spectroscopy. 1995, Vol 50, Num 1, pp 63-66, issn 0584-8547, SUPDISArticle

Impedance transition and series resonance between bulk plasma and sheath in biased inductively coupled plasmaLEE, Hyo-Chang; CHUNG, Chin-Wook.Thin solid films. 2010, Vol 518, Num 18, pp 5219-5222, issn 0040-6090, 4 p.Article

Inductively Coupled RF Oxygen Plasma Studied by Spatially Resolved Optical Emission SpectroscopyKREGAR, Zlatko; KRSTULOVIC, Niksa; MILOSEVIC, Slobodan et al.IEEE transactions on plasma science. 2008, Vol 36, Num 4, pp 1368-1369, issn 0093-3813, 2 p., 1Article

The use of high density plasma system to improve the etch properties of the zinc tin oxide thin film for transparent thin film transistors active layersWOO, Jong-Chang; CHUN, Yoon-Soo; KIM, Chang-Il et al.Applied surface science. 2014, Vol 292, pp 915-920, issn 0169-4332, 6 p.Article

Synthesis, studies and fuel cell performance of core—shell electrocatalysts for oxygen reduction reaction based on a PtNix carbon nitride shell and a pyrolyzed polyketone nanoball coreDI NOTA, V; NEGRO, E; POLIZZI, S et al.International journal of hydrogen energy. 2014, Vol 39, Num 6, pp 2812-2827, issn 0360-3199, 16 p.Conference Paper

Determination of functionalized gold nanoparticles incorporated in hydrophilic and hydrophobic microenvironments by surface modification of quartz crystal microbalanceWU, Tsui-Hsun; LIAO, Shu-Chuan; CHEN, Ying-Fang et al.Applied surface science. 2013, Vol 274, pp 418-424, issn 0169-4332, 7 p.Article

Comparison of line edge roughness and profile angles of chemical vapor deposited amorphous carbon etched in O2/N2/Ar and H2/N2/Ar inductively coupled plasmasPARK, Y. R; KWON, B. S; JUNG, C. Y et al.Thin solid films. 2011, Vol 519, Num 20, pp 6755-6758, issn 0040-6090, 4 p.Conference Paper

Formation of Sn metal spheres by plasma treatmentHAN, Dong-Hoon; SOON HO KWON; JUNG JOONG LEE et al.Thin solid films. 2011, Vol 519, Num 20, pp 7106-7110, issn 0040-6090, 5 p.Conference Paper

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